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Extreme Ultraviolet Lithography (EUVL) Seminar Report With PPT

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Description

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ABSTRACT

Silicon has been the heart of the world’s technology boom for nearly half a century. Each year, manufacturers bring out the next great computer chip that boosts computing power and allows our Personal Computers to do more than we imagined just a decade ago. The current technology used to make microprocessors, deep ultraviolet lithography will begin to reach its limit around 2005. At that time, chipmakers will have to look to other technologies to cram more transistors onto silicon to create powerful chips. Many are already looking at extreme-ultraviolet lithography (EUVL) as a way to extend the life of silicon at least until the end of the decade.

Extreme Ultraviolet Lithography (EUVL) Seminar Report

Page Length : 23

Content :

  • Abstract
  • Introduction
  • EUVL Definition
    • EUVL Radiation
    • Lithography
  • Why EUVL?
    • Moore’s Law
    • Incredible Shrinking Chips
  • EUVL Technology
  • How EUVL Chip making Work
    • Making Chips
    • The EUVL Process
  • Conclusion
  • Reference

Extreme Ultraviolet Lithography (EUVL) Presentation Report (PPT)

Page Length : 19

Content :

  • Lithography
  • Introduction to EUVL
  • Basic concepts
  • Why do we need EUVL?
  • EUVL Process
  • Basic technology for EUV
  • EUV masks
  • All Reflective Optics
  • Advantages
  • Disadvantages
  • Conclusion

Additional information

Product Name

Extreme Ultraviolet Lithography (Euvl) Seminar Report with PPT

Product Size

3.53 MB

Format

File Format

, ,

File Category

,

DEPARTMENT/COURSE

Need For

College, Semester, University

Product Type

Created By

Siddharth Vairagi (NIT Agartala)

Uploaded By

Aravind Gupta

Languages

English

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